Particle detector for rough surfaces

Details Particle detector for rough surfaces Particle detector for rough surfaces

1991-07-26

1993-02-23

McGraw, Vincent P.

Optics: measuring and testing

For optical fiber or waveguide inspection

250572, 356237, G01N 2188

Patent

active

051894815

ABSTRACT:
A surface inspection apparatus having multiple inspection stations to inspect a wafer for a number of characteristics. The wafer is placed on a chuck connected to a rack-and-pinion or equivalent system so that the wafer simultaneously rotates and translates under the fixed position of the inspection stations. A single light source may be used by all stations in turn. One station may be a particle detector with collection optics receiving a small select portion of the light scattered from the wafer surface. A second station may be a roughness detector with a collection system to direct a large portion of scattered light to a detector. A position sensitive detector may be used to determine the slope of the wafer surface at an inspection point when the wafer is not clamped to the chuck, giving a measure of surface deformation. These or other stations are positioned about either of two inspection points at which the beam from the light source may be directed. The inspection points are spaced one wafer radius apart to minimize the required wafer motion for a complete surface scan.

REFERENCES:
patent: 3857637 (1974-12-01), Obenreder
patent: 4069484 (1978-01-01), Firester et al.
patent: 4614427 (1986-09-01), Koizumi et al.
patent: 4740708 (1988-04-01), Batchelder
patent: 4902131 (1990-02-01), Yamazaki et al.
R. Browning et al., "Recent advances in automated patterned wafer inspection," SPIE Proceedings, vol. 1087, pp. 440-445 (1989).
Tencor Instruments, Surfscan 7000 Patterned Wafer Contamination Analyzer, (product brochure), Mar. 19909.

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