Particle detection system

Optics: measuring and testing – For size of particles – By particle light scattering

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356339, G01N 1502

Patent

active

054671884

ABSTRACT:
A particle detecting system for detecting the number and size of particles generated in a process chamber of a semiconductor manufacturing system. The particle detecting system includes a small detection chamber and a particle detector. The small detection chamber not only has an internal space thereof provided outside a wall portion forming the process vacuum chamber so as to communicate with the process vacuum chamber, but also laser beam transmitting windows and scattered light extracting windows. The particle detector is arranged in an atmospheric environment outside the detection chamber and including a laser diode for emitting a laser beam into the detection chamber through the laser beam transmitting windows and photosensors for detecting scattered light generated within the detection chamber through the scattered light extracting windows. The detection chamber has such a structure as to be detachably attached to the process chamber. The particle detector is formed as a module, and can be attached to the detection chamber from outside the detection chamber. The particle detector has such a structure as to be detachably attached to the detection chamber.

REFERENCES:
patent: 4387993 (1983-06-01), Adrian
patent: 4420256 (1983-12-01), Fladda et al.
patent: 4571079 (1986-02-01), Knollenberg
patent: 4573796 (1986-03-01), Martin et al.
patent: 4680977 (1987-07-01), Conero et al.
patent: 4728190 (1988-03-01), Knollenberg
patent: 4739177 (1988-04-01), Borden
patent: 4781459 (1988-11-01), Suzuki
patent: 4783599 (1988-11-01), Borden
patent: 4792199 (1988-12-01), Borden
patent: 4798465 (1989-01-01), Knollenberg
patent: 4804853 (1989-02-01), Borden et al.
patent: 4825094 (1989-04-01), Borden et al.
patent: 4893928 (1990-01-01), Knollenberg
patent: 4896048 (1990-01-01), Borden
patent: 5055698 (1991-10-01), Borden
patent: 5084614 (1992-01-01), Berkner
patent: 5085500 (1992-02-01), Blesener
patent: 5121988 (1992-06-01), Blesener et al.
patent: 5132548 (1992-07-01), Borden et al.
patent: 5157678 (1992-10-01), Borden
patent: 5235625 (1993-08-01), Stoltz et al.
patent: 5271264 (1993-12-01), Chanayem
patent: 5282151 (1994-01-01), Knollengerg
U.S. Pat. No. 5,083,865 (Gazette, Jan. 28, 1992, p. 2103).
Busselman et al, "In Situ Particle Monitoring in a Single Wafer Poly Silicon and Silicon Nitride Etch System", 1993 IEEE/SEMI Int'l Semiconductor Manufacturing Science Symposium, pp. 20-26.
Peters, "20 Good Reasons to Use In Situ Particle Monitors", Semiconductor International, Nov. 1992, pp. 52-57.

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