Particle deposition apparatus, particle deposition method,...

Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized

Reexamination Certificate

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C427S294000, C427S598000, C118S623000, C118S625000, C118S634000

Reexamination Certificate

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07829154

ABSTRACT:
To provide a (homogeneous) particle deposit without any impurity contamination, on which only particles with a desired size are deposited. A solution, with particles dispersed in a solvent, is jetted as a flow of fine liquid droplets from a tip part of a capillary, and the jetted fine liquid droplets are electrically charged. This flow of the droplets is introduced into a vacuum chamber through a jet nozzle, as a free jet flow. The free jet flow that travels in the vacuum chamber is introduced into an inside of a deposition chamber, inside of which is set at lower pressure, through a skimmer nozzle provided in the deposition chamber, as an ion beam. Subsequently, by an energy separation device, only particles having particular energy are selected from the electrically charged particles in the flow, and are deposited on a deposited body disposed in an inside of the deposition chamber.

REFERENCES:
patent: 4559096 (1985-12-01), Friedman et al.
patent: 4770738 (1988-09-01), Robillard
patent: 5015845 (1991-05-01), Allen et al.
patent: 5965212 (1999-10-01), Dobson et al.
patent: 6280802 (2001-08-01), Akedo et al.
patent: 2003/0122090 (2003-07-01), Tsukihara et al.
patent: 2005/0230642 (2005-10-01), Halling et al.
patent: A 62-169319 (1987-07-01), None
patent: A-64-022364 (1989-01-01), None
patent: A 2-189159 (1990-07-01), None
patent: A 5-62896 (1993-03-01), None
patent: A 7-30151 (1995-01-01), None
patent: A 7-86164 (1995-03-01), None
patent: A 11-510314 (1999-09-01), None
patent: A 11-354843 (1999-12-01), None
patent: WO 97/04906 (1997-02-01), None
M Danek et al., “Electrospray organometallic chemical vapor deposition—A novel technique for preparation of II-Vi quantum dot Composites,” Appl. Phys. Lett. vol. 65 No. 22, 1994, pp. 2795-2797.
C. Petit et al., “Three dimensional arrays of cobalt nanocrystals: Fabrication and magnetic properties,” Journal of Applied Physics, vol. 91, No. 3, 2002, pp. 1502-1508.
C. Petit, “Magnetic properties of cobalt and cobalt-platinum nanocrystals investigated by magneto-optical Kerr effect,” Journal of Applied Physics, vol. 95, No. 8, 2004, pp. 4251-4260.
M. Danek et al.: “Electrospray Oranometallic Chemical Vapor Deposition—A Novel Technique for Prepapration of II-VI Quantum Dot Composites” Appl. Phys. Lett., vol. 65, 1994, pp. 2795-2797, XP002477187.

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