Semiconductor device manufacturing: process – Including control responsive to sensed condition
Reexamination Certificate
2007-01-23
2007-01-23
Coleman, W. David (Department: 2823)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
C438S011000, C257SE21528
Reexamination Certificate
active
10376274
ABSTRACT:
A particle control device and a particle control method are capable of controlling the occurrences of particles in a vacuum reactor. The particle control device is used in a vacuum processing apparatus having a vacuum reactor, a gas delivery unit for supplying processing gases to the vacuum reactor, and a sample table for supporting a sample in the vacuum reactor, wherein the apparatus subjects the sample to vacuum processing. The particle control device detects particles floating inside the vacuum reactor; generates apparatus condition data indicating a condition of the vacuum processing apparatus; and determines a component which is high in a particle occurrence probability based on detected particle data and apparatus condition data, thereby enabling display of the component selected as the particle source.
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Arai Takeshi
Kagoshima Akira
Nakano Hiroyuki
Shiraishi Daisuke
Yamamoto Hideyuki
Antonelli, Terry Stout and Kraus, LLP.
Coleman W. David
Hitachi High-Technologies Corporation
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