Radiant energy – Electrically neutral molecular or atomic beam devices and...
Patent
1989-02-16
1990-07-03
Anderson, Bruce C.
Radiant energy
Electrically neutral molecular or atomic beam devices and...
250398, H01J 3700
Patent
active
049393600
ABSTRACT:
A particle beam irradiating apparatus including a particle beam irradiating device for irradiating a charged particle beam such as ions or electrons to a specimen. A charged particle source is included for irradiating an electron beam to the specimen which is positively charged or an ion beam to the specimen which is negatively charged so as to neutralize the specimen, and a voltage supply is include for applying a bias voltage difference not more than 10 V between the charged particle source and the specimen. As the specimen is not charged with a high voltage, the specimen does not break down.
The particle beam irradiating apparatus is effectively used in an electron microscope, an electron beam lithography system, an ion implanter, an ion microprobe analyzer, a secondary ion mass spectrometer.
REFERENCES:
patent: 3507709 (1970-04-01), Bower
patent: 3665185 (1972-05-01), Goff
patent: 4118630 (1978-10-01), McKenna et al.
patent: 4135097 (1979-01-01), Forneris et al.
patent: 4361762 (1982-11-01), Douglas
patent: 4419203 (1983-12-01), Harper et al.
patent: 4453086 (1984-06-01), Grobman
patent: 4463255 (1984-07-01), Robertson et al.
patent: 4639301 (1987-01-01), Doherty et al.
patent: 4675530 (1987-06-01), Rose et al.
patent: 4748325 (1988-05-01), Sladzian
patent: 4825087 (1989-04-01), Renau et al.
Anderson Bruce C.
Hitachi , Ltd.
LandOfFree
Particle beam irradiating apparatus having charge suppressing de does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Particle beam irradiating apparatus having charge suppressing de, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particle beam irradiating apparatus having charge suppressing de will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1892673