Particle beam injection system

Electric lamp and discharge devices: systems – Pulsating or a.c. supply – Plural load device systems

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3151117, 176 3, G21B 102, H01J 714

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active

040653510

ABSTRACT:
This invention provides a poloidal divertor for stacking counterstreaming ion beams to provide high intensity colliding beams. To this end, method and apparatus are provided that inject high energy, high velocity, ordered, atomic deuterium and tritium beams into a lower energy, toroidal, thermal equilibrium, neutral, target plasma column that is magnetically confined along an endless magnetic axis in a strong restoring force magnetic field having helical field lines to produce counterstreaming deuteron and triton beams that are received bent, stacked and transported along the endless axis, while a poloidal divertor removes thermal ions and electrons all along the axis to increase the density of the counterstreaming ion beams and the reaction products resulting therefrom. By balancing the stacking and removal, colliding, strong focused particle beams, reaction products and reactions are produced that convert one form of energy into another form of energy.

REFERENCES:
patent: 2979635 (1961-04-01), Burleigh
patent: 2997431 (1961-08-01), Bell et al.
patent: 3343020 (1967-09-01), Gordon
patent: 3607627 (1971-09-01), Furth et al.
patent: 3663361 (1972-05-01), Yoshikawa
patent: 3663362 (1972-05-01), Stix
patent: 3713967 (1973-01-01), Hamilton et al.
Scientific American, vol. 227, No. 1 (7/72) Coppi et al., pp. 65-75.
Physics Today (11/75) Kadomtsev et al.
Nuclear Engineering International, N.E.I. (vol. 17, No. 98) pp. 946-949.
Science, vol. 166 (10/17/69), Holcomb, pp. 363-364.
Matt-1050 (8/74) pp. 526-542.
Matt-1087 (1/75) pp. 1-6.
Ornl-4688 (8/71) pp. 44-66.

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