Particle beam imaging system having hollow beam illumination

Details Particle beam imaging system having hollow beam illumination Particle beam imaging system having hollow beam illumination

1996-06-26

1998-10-13

Nguyen, Kiet T.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 2504922, H01J 3709

Patent

active

058215425

ABSTRACT:
An charged particle beam imaging system reduces aberrations affecting resolution at the workpiece where the aberrations are caused by interactions between the charged particles in the beam. The average distance between the particles at a crossover image in the illumination subsystem is increased by positioning an annular aperture at the crossover image.

REFERENCES:
patent: 3795813 (1974-03-01), Kunath
patent: 3996468 (1976-12-01), Fletcher et al.
patent: 4231811 (1980-11-01), Somekh et al.
patent: 4238680 (1980-12-01), Anger et al.
patent: 4947413 (1990-08-01), Jewell et al.
patent: 5348837 (1994-09-01), Fukuda et al.
K. D. Cummings, "A study of deposited charge from electron beam lithography", J.Vac.Sci. Technol. B8(6), Nov./Dec. 1990, pp. 1786-1788.
W. Liu, et al., "Resist charging in electron beam lithography", J. Vac. Sci. Technol. B 13(5), Sep./Oct. 1995, pp. 1979-1983.
R. F. Pease, "Resist Charging in Electron Beam Lithography", SRC Technical Report T95068 Contract No. 93-MJ-223, Stanford University, May 1995.

Affiliated with

Also associated with

Rating

Particle beam imaging system having hollow beam illumination does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Particle beam imaging system having hollow beam illumination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particle beam imaging system having hollow beam illumination will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-315049