Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2011-04-26
2011-04-26
Souw, Bernard E (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S3960ML
Reexamination Certificate
active
07932501
ABSTRACT:
A particle-beam exposure apparatus and a particle-beam therapeutic apparatus are obtained, in which, by reducing diameter increase, due to scattering in a range shifter, of a charged particle beam, the charged particle beam whose diameter is so narrow that spatially accurate exposure into the target is possible can be supplied, as well as, by placing the range shifter at a position apart from a patient, intimidation caused by a movement noise, etc. can be prevented. A particle-beam exposure apparatus and a particle-beam therapeutic apparatus include a range shifter4for varying energy of a charged particle beam with a thickness of the range shifter4being changed during exposure of the charged particle beam, so that a range of the charged particle beam at a target5to be exposed is set to a desired value; and a set of quadrupole magnets6, being placed between the range shifter4and the target5, based on the magnetization amount of the set of quadrupole magnets6being controlled corresponding to the charged-particle-beam energy varied by the range shifter4, for reducing diameter increase, due to scattering at the range shifter4, of the charged particle beam at the target5.
REFERENCES:
patent: 5111173 (1992-05-01), Matsuda et al.
patent: 5260581 (1993-11-01), Lesyna et al.
patent: 5363008 (1994-11-01), Hiramoto et al.
patent: 5789875 (1998-08-01), Hiramoto et al.
patent: 5969367 (1999-10-01), Hiramoto et al.
patent: 6218675 (2001-04-01), Akiyama et al.
patent: 6316776 (2001-11-01), Hiramoto et al.
patent: 6424084 (2002-07-01), Kimiya et al.
patent: 6479926 (2002-11-01), Awano et al.
patent: 6597096 (2003-07-01), Amano et al.
patent: 6814694 (2004-11-01), Pedroni
patent: 6859741 (2005-02-01), Haberer et al.
patent: 7122978 (2006-10-01), Nakanishi et al.
patent: 7154107 (2006-12-01), Yanagisawa et al.
patent: 7326942 (2008-02-01), Shichi et al.
patent: 7449701 (2008-11-01), Fujimaki et al.
patent: 2004/0000650 (2004-01-01), Yanagisawa et al.
patent: 2004/0056212 (2004-03-01), Yanagisawa et al.
patent: 2004/0149934 (2004-08-01), Yanagisawa et al.
patent: 2004/0162457 (2004-08-01), Maggiore et al.
patent: 2004/0200983 (2004-10-01), Fujimaki et al.
patent: 2005/0231138 (2005-10-01), Nakanishi et al.
patent: 2006/0065854 (2006-03-01), Shichi et al.
patent: 2010/0213384 (2010-08-01), Furukawa et al.
patent: 11-197258 (1999-07-01), None
patent: 2001-000562 (2001-01-01), None
patent: 2001-061978 (2001-03-01), None
patent: 2001-212253 (2001-08-01), None
patent: 2002-189004 (2002-07-01), None
patent: 2004-069683 (2004-03-01), None
patent: 2004-144538 (2004-05-01), None
patent: 2004-192931 (2004-07-01), None
patent: 2004-321830 (2004-11-01), None
Buchanan & Ingersoll & Rooney PC
Mitsubishi Electric Corporation
Smyth Andrew
Souw Bernard E
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