Parallel process focus compensation

Details Parallel process focus compensation Parallel process focus compensation

2011-05-10

2011-05-10

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

Focus or magnification control

Reexamination Certificate

active

07940374

ABSTRACT:
Disclosed are systems, methods, and computer program products for parallel process focus compensation. Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of the first surface of the wafer. The first sensor may be, for example, an air gauge. Second, a second sensor senses the top surface of the wafer in parallel with the first sensor to provide second-sensor data which defines a second topographic map of the first surface of the wafer. The second sensor may be, for example, an optical sensor or a capacitance sensor. Third, a calibration module calibrates focus-positioning parameters of an exposure system based on the first- and second-sensor data. The calibration module may be embodied in hardware, software, firmware, or a combination thereof.

REFERENCES:
patent: 6208407 (2001-03-01), Loopstra
patent: 6674510 (2004-01-01), Jasper et al.
patent: 6859260 (2005-02-01), Nelson et al.
patent: 7239371 (2007-07-01), Liegl et al.

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