Parallel flow reactor having improved thermal control

Chemistry: analytical and immunological testing – Testing of catalyst

Reexamination Certificate

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C436S180000, C436S183000, C422S129000, C422S130000, C422S105000

Reexamination Certificate

active

07118917

ABSTRACT:
Parallel flow chemical processing systems, such as parallel flow chemical reaction systems are disclosed. These systems are adapted to simultaneously and independently vary temperature between separate flow channels, preferably by employing separate, individual heating elements in thermal communication with each of four or more parallel flow reactors. The flow reactors are preferably isolated from each other using a thermal isolation system comprising fluid-based heat exchange. In preferred embodiments, the axial heat flux can be fixedly or controllably varied.

REFERENCES:
patent: 3431077 (1969-03-01), Danforth
patent: 3536452 (1970-10-01), Norton et al.
patent: 4099923 (1978-07-01), Milberger
patent: 4705669 (1987-11-01), Tsuji et al.
patent: 4869282 (1989-09-01), Sittler et al.
patent: 4996387 (1991-02-01), Gerhold et al.
patent: 5089232 (1992-02-01), May
patent: 5252294 (1993-10-01), Kroy et al.
patent: 5304354 (1994-04-01), Finley et al.
patent: 5324483 (1994-06-01), Cody et al.
patent: 5417938 (1995-05-01), Shelden et al.
patent: 5534328 (1996-07-01), Ashmead et al.
patent: 5580523 (1996-12-01), Bard
patent: 5589136 (1996-12-01), Northrup et al.
patent: 5593642 (1997-01-01), DeWitt et al.
patent: 5595712 (1997-01-01), Harbster et al.
patent: 5603351 (1997-02-01), Cherukuri et al.
patent: 5611214 (1997-03-01), Wegeng et al.
patent: 5639423 (1997-06-01), Northrup et al.
patent: 5658537 (1997-08-01), Dugan
patent: 5690763 (1997-11-01), Ashmead et al.
patent: 5750906 (1998-05-01), Parker et al.
patent: 5776359 (1998-07-01), Schultz et al.
patent: 5780748 (1998-07-01), Barth
patent: 5811062 (1998-09-01), Wegeng et al.
patent: 5833926 (1998-11-01), Wurzel et al.
patent: 5842787 (1998-12-01), Kopf-Sill et al.
patent: 5843385 (1998-12-01), Dugan
patent: 5863801 (1999-01-01), Southgate et al.
patent: 5865417 (1999-02-01), Harris et al.
patent: 5869004 (1999-02-01), Parce et al.
patent: 5872010 (1999-02-01), Karger et al.
patent: 5922591 (1999-07-01), Anderson et al.
patent: 5927325 (1999-07-01), Bensaoula et al.
patent: 5959297 (1999-09-01), Weinberg et al.
patent: 5985356 (1999-11-01), Schultz et al.
patent: 6004617 (1999-12-01), Schultz et al.
patent: 6030917 (2000-02-01), Weinberg et al.
patent: 6033544 (2000-03-01), Demers et al.
patent: 6063633 (2000-05-01), Willson
patent: 6087181 (2000-07-01), Cong
patent: 6149882 (2000-11-01), Guan et al.
patent: 6175409 (2001-01-01), Nielsen et al.
patent: 6616909 (2003-09-01), Tonkovich et al.
patent: 6680044 (2004-01-01), Tonkovich et al.
patent: 6737026 (2004-05-01), Bergh et al.
patent: 6749814 (2004-06-01), Bergh et al.
patent: 6805841 (2004-10-01), Shvets et al.
patent: 6881312 (2005-04-01), Kopf-Sill et al.
patent: 6902934 (2005-06-01), Bergh et al.
patent: 2002/0014106 (2002-02-01), Srinivasan et al.
patent: 2002/0042140 (2002-04-01), Hagemeyer et al.
patent: 2002/0045265 (2002-04-01), Bergh et al.
patent: 2002/0048536 (2002-04-01), Bergh et al.
patent: 2004/0141893 (2004-07-01), Martin
patent: 2005/0009175 (2005-01-01), Bergh et al.
patent: 2005/0175519 (2005-08-01), Rogers et al.
patent: 27 14 939 (1979-11-01), None
patent: DD 234941 (1986-04-01), None
patent: 196 32 779 (1998-02-01), None
patent: 198 05 719 (1999-08-01), None
patent: 198 06 848 (1999-08-01), None
patent: 198 09 477 (1999-09-01), None
patent: 198 55 894 (2000-06-01), None
patent: 0 796 654 (1997-09-01), None
patent: 0 886 143 (1998-12-01), None
patent: 967261 (1962-03-01), None
patent: WO 98/07026 (1996-02-01), None
patent: WO 96/15576 (1996-05-01), None
patent: WO 97/32208 (1997-09-01), None
patent: WO 98/00231 (1998-01-01), None
patent: WO 98/03521 (1998-01-01), None
patent: WO 98/13137 (1998-04-01), None
patent: WO 98/13605 (1998-04-01), None
patent: WO 98/16949 (1998-04-01), None
patent: WO 98/22811 (1998-05-01), None
patent: WO 98/53236 (1998-11-01), None
patent: WO 98/55852 (1998-12-01), None
patent: WO 98/56505 (1998-12-01), None
patent: WO 99/41005 (1999-08-01), None
patent: WO 99/64160 (1999-12-01), None
patent: WO 00/09255 (2000-02-01), None
patent: WO 00/14529 (2000-03-01), None
patent: WO 00/17413 (2000-03-01), None
patent: WO 00/51720 (2000-09-01), None
patent: WO 01/00315 (2001-01-01), None
Berenschot, J.W., et al., “Micromachining of (111) Plates in <001> Oriented Silicon”,J. Micromech. Microeng.8 (1998) 104-107.
Brenchley, D.L. et al., “Status of Microchemical Systems Development in the United States of America”, AICHE, 2ndInternational Conference on Microreaction Technology, New Orleans, Louisiana, Mar. 9-12, 1998, pp. 18-23.
Bruns, M.W., “The Application of Silicon Micromachining Technology and High Speed Gas Chromatography to On-Line Process Control”,MTI Analytical Instruments.
Bruns, M.W., “Silicon Micromachining and High Speed High Gas Chromatography”,IEEE, 1992, pp. 1640-1644.
Bryzek, J. et al., “Micromachines on the March”,IEEE Spectrum, 1994, pp. 20-31.
Burns, J.R. et al., “Development of Microreactor for Chemical Production”, AICHE, 2ndInternational Conference on Microreaction Technology, New Orleans, Louisiana, Mar. 9-12, 1998, pp. 39-44.
Cooke, William S., 403P “Decreasing Gas Chromatagrphy Analysis Times Using a Multicapillary Column”, PITTCON '96, Chicago, Illinois, Mar. 3-8, 1996.
Franz, A.J. et al., “New Operating Regimes and Applications Feasible with Microreactors”, MIT, 1997, pp. 33-38.
Greenway, G.M. et al., “The Use of a Novel Microreactor for High Throughput Continuous Flow Organic Synthesis”,Sensors and Actuators B, 2000, pp. 153-158.
Grosjean et al., “A Practical Thermopneumatic Valve”,IEEE, 1999, pp. 147-152.
Haswell, Stephen J. et al., “The Application of Micro Reactors to Synthetic Chemistry”,Chem. Commun., 2001, 391-398.
Hendrix, Charles D., “What Every Technologist Should Know About Experimental Design”,Chemtech, 1979, pp. 167-174.
Henning, A.K. et al., “Microfluidic MEMS for Semiconductor Processing”,IEEE, 1998, vol. 21, pp. 329-337.
Hinderling, C. et al., “Rapid Screening of Olefin Polymerization Catalyst Libraries by Electrospray Ionization Tandem Mass Spectrometry”,Angew. Chem. Int. Ed.,1999, 38, No. 15, pp. 2253-2256.
Jäckel, K.-P., “Microtechnology: Application Opportunities in the Chemical Industry”,DECHEMA Monographs, 1996, vol. 132, VCH Vertagsgesellschaft, pp. 29-50.
Johansson, S. et al., “Nanofabrication of Model Catalysts and Simulations of their Reaction Kinetics”,J. Vac. Sci. Technol.,1999, A 17(1), pp. 297-302.
Klein, J. et al., “Combinatorial Material Libraries on the Microgram Scale with an Example of Hydrothermal Synthesis”,Angew. Chem. Int. Ed.,1998, 37(24); 3369-3372.
Lambert, R.H. et al., “Utilization of a Portable Microchip Gas Chromatograph to Identify and Reduce Fugitive Emissions at a Pharmaceutical Manufacturing Plant”,Field Analytical Chemistry and Technology, 1997, 1(6): 367-374.
Löwe, H. et al., “Microreactor Concepts for Heterogeneous Gas Phase Reactions”, AICHE, 2ndInternational Conference on Microreaction Technology, New Orleans, Louisiana, Mar. 9-12, 1998, pp. 63-73.
Matlosz, M. et al., “Microsectioned Electrochemical Reactors for Selective Partial Oxidation”, AICHE, 2ndInternational Conference on Microreaction Technology, New Orleans, Louisiana, Mar. 9-12, 1998, pp. 54-59.
Oosterbroek, R.E. et al., “Utilizing the (111) Plane Switch-Over Etching Process for Micro Fluid Control Applications”.
Pérez-Ramirez, J. et al., “The Six-Flow Reactor Technology-A Review on Fast Catalyst Screening and Kinetic Studies”,Catalysis Today, 2000, 60, 93-109.
Rich et al., “An 8-Bit Microflow Controller Using Pneumatically-Actuated Valves”,IEEE,1999, pp. 130-134.
Sadler, D.J. et al., “A New Magnetically Actuated Microvalve For Liquid and Gas Control Applications”, Center for Microelectronic Sensors and MEMS, Univeristy of Cincinnati.
Sie, S.T., “

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