Parallax barrier, multiple display device and parallax...

Liquid crystal cells – elements and systems – Liquid crystal system – Stereoscopic

Reexamination Certificate

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C349S110000

Reexamination Certificate

active

07612834

ABSTRACT:
A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.

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Official communication issued in the International Application No. PCT/JP2006/312722; mailed on Jul. 25, 2006.

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