Chemistry: electrical and wave energy – Processes and products
Patent
1984-08-10
1985-10-08
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
C25D 350
Patent
active
045458685
ABSTRACT:
The invention relates to a method for high speed palladium electroplating by immersing the object to be plated in an ammoniacal solution of a palladium tetra-amino complex ion, palladium metal in a concentration of at least 10 g/l, and at least one carbonate or phosphate anion in a concentration of more than about 7.5 g/l and less than about 150 g/l. The solution has a pH of between about 7 and 9 and is free of quaternized pyridinium brightening agents. Palladium is plated into a substrate with high speed plating equipment which provides sufficient agitation, and current densities of 100 ASF and above to produce lustrous crack free deposits.
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Martin James L.
McCaskie John E.
Toben Michael P.
Kaplan G. L.
Lea-Ronal, Inc.
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