Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Packaging or treatment of packaged semiconductor
Reexamination Certificate
2011-08-02
2011-08-02
Nguyen, Cuong Q (Department: 2811)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Packaging or treatment of packaged semiconductor
C438S048000, C438S054000, C438S069000, C438S029000, C438S026000, C257S431000, C257S448000, C257S078000, C257S294000, C257SE21388
Reexamination Certificate
active
07989237
ABSTRACT:
Silicon substrates are applied to the package structure of solid-state lighting devices. Wet etching is performed to both top and bottom surfaces of the silicon substrate to form reflecting cavity and electrode access holes. Materials of the reflecting layer and electrode can be different from each other whose preferred materials can be chosen in accordance with a correspondent function. Formation of the electrode can be patterned by an etching method or a lift-off method.
REFERENCES:
patent: 6531328 (2003-03-01), Chen
patent: 2004/0211970 (2004-10-01), Hayashimoto et al.
patent: 2006/0208271 (2006-09-01), Kim et al.
Chen Lung Hsin
Tseng Wen Liang
Advances Optoelectronic Technology, Inc.
Chew Raymond J.
Lam Cathy N
Nguyen Cuong Q
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