Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1996-04-17
1997-12-30
Jordan, Charles T.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
42218605, 42218607, 42218612, 42218618, C01B 1311
Patent
active
057026734
ABSTRACT:
An ozone generating apparatus produces highly pure ozone gas which can be used in a semiconductor manufacturing process. The ozone generating apparatus comprises a high voltage source, an ozone generating cell which generates ozone gas by supplying a material gas while applying a high voltage from the high voltage source, and a passage for delivering the generated ozone gas from the ozone generating cell to a desired location. The passage comprises a material which has a passivation film formed by a passivation treatment in a dry process. The oxide passivation film comprises chromium oxide film, iron oxide film or a composite film of chromium oxide and iron oxide.
REFERENCES:
patent: 5332555 (1994-07-01), Hosokawa et al.
patent: 5370846 (1994-12-01), Yokomi et al.
patent: 5549874 (1996-08-01), Kamiya et al.
Pending U.S. Application Serial No. 08/517,879, Harada et al.
"The Technology of Chromium Oxide Passivation on Stainless Steel Surface", Tadahiro Ohmi et al., 1993.
"Corrosion Resistance of Fluorine Passivation of Metal Surface", Reiko Takahashi et al.
Shigeo Shimizu et al., "The Development of Ozone Oxidization Treatment Method on Electro Chemical Buffing Stainless Steel for Clean System", Technical News published by Hitachi Zosen Corporation, Oct. 1994, vol. 55, No. 3, pp. 61-66 (including English Abstract).
Database WPI, Week 7812, Derwent Publications Ltd., London, GB; AN 78-22956, XP002006232 & JP-A-53 015 289 (Mitsubishi Electrtic Corp.), 10 Feb. 1978, Abstract.
Harada Minoru
Kaji Naruhiko
Nakano Yutaka
Nakata Rempei
Shinjo Ryoichi
Ebara Corporation
Jenkins Daniel
Jordan Charles T.
Kabushiki Kaisha Toshiba
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