Ozone asher

Details Ozone asher Ozone asher

1996-10-10

1999-11-30

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

H05H 100

Patent

active

059935952

ABSTRACT:
An ozone asher includes: a chamber having a closed space isolated from an atmosphere, and an opening through which the semiconductor substrate to be etched is inserted and withdrawn from the chamber; an upper cover forming an upper portion of the chamber, having ozone injection holes for supplying ozone into the chamber; a plurality of holders for holding the semiconductor substrate inserted in the chamber through the opening; a pedestal provided to be raised and lowered in the chamber and supporting the semiconductor substrate during the whole procedure; vacuum means provided at the pedestal for drawing and holding the semiconductor substrate to the pedestal; heating means for the semiconductor substrate provided at the pedestal; means for raising and lowering the pedestal and the heating means; means for keeping a gap between the pedestal and the upper cover during the elevating of the semiconductor substrate; and a slit door for opening and closing the opening of the chamber selectively.

REFERENCES:
patent: 4812201 (1989-03-01), Sakai et al.
patent: 4838978 (1989-06-01), Sekine et al.
patent: 5176782 (1993-01-01), Ishibashi et al.
patent: 5558717 (1996-09-01), Zhao et al.

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