Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1995-06-06
1997-01-14
Bell, Bruce F.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204425, 204419, 427103, 4271263, 427245, 4273722, 427446, 427453, 427454, G01N 2726
Patent
active
055935583
ABSTRACT:
An oxygen concentration detector includes a one-end closed cylindrical oxygen sensing element having an inside electrode, outside electrode provided on the inner side and outer side respectively, an electrode protecting layer made up of ceramics porous member provided further outside the outside electrode, and a trap layer 1 of ceramics porous member having a surface roughness of 20 to 100 .mu.m measured according to a 10 point mean roughness measurement and provided outside the electrode protecting layer is employed. By dipping the to-be-detected gas side surface of an oxygen sensing element into a slurry with coarse heat-resisting metal oxide particles, 2 to 50 .mu.m in average grain size, dispersed, depositing the slurry on the surface of a protective layer of an oxygen sensor element, thereafter drying and baking the deposit, a porous poisonous substance trap layer, 10 to 500 .mu.m thick, is formed. The dipping is performed after a previous degassing and strong stirring of said slurry and the stop of stirring.
REFERENCES:
patent: 4066413 (1978-01-01), Segawa et al.
patent: 4177112 (1979-12-01), Suzuki et al.
patent: 4402820 (1983-09-01), Sano et al.
patent: 4584086 (1986-04-01), Hayakawa et al.
patent: 5160598 (1992-11-01), Sawada et al.
patent: 5310575 (1994-05-01), Friese et al.
Fujii Namitsugu
Hotta Yasumichi
Sano Hiromi
Shibata Masahiro
Sugino Hiroshi
Bell Bruce F.
Nippondenso Co. Ltd.
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