Oxyfluorination

Details Oxyfluorination Oxyfluorination

2007-06-05

2007-06-05

Gravini, S. (Department: 3749)

Drying and gas or vapor contact with solids

Process

Retarding or shielding of treatment

C034S329000, C034S418000, C428S457000, C156S060000, C427S403000

Reexamination Certificate

active

10532461

ABSTRACT:
The invention provides a process for the activation by oxyfluorination of at least part of a surface of a solid, which process includes exposing, under selected conditions of temperature and pressure and for a selected reaction time, at least part of the surface of the material of the solid to an oxfluorinating atmosphere. The oxyfluorinating atmosphere is a gas/vapor mixture which includes at least one fluorine-containing gas which reacts with the material of the exposed surface, at least one oxygen-containing gas which reacts with the material of the exposed surface, and water vapor. The gases in the oxyfluorinating atmosphere act to oxyfluorinate the exposed surface, thereby to activate it, and the water vapor acts to enhance the activation.

REFERENCES:
patent: 4800053 (1989-01-01), Bauman et al.
patent: 6620282 (2003-09-01), Mori et al.
patent: 6790526 (2004-09-01), Vargo et al.
patent: 2001/0009176 (2001-07-01), Mori et al.
patent: 1336281 (2002-02-01), None
patent: 1488931 (1977-10-01), None
patent: 58199132 (1983-11-01), None
PCT International Search Report for International Patent Application No. PCT/US2003/004701 (cited references listed above).

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