Oxonol compound, light-sensitive material and process for the sy

Details Oxonol compound, light-sensitive material and process for the sy Oxonol compound, light-sensitive material and process for the sy

1999-01-20

2000-12-12

McKane, Joseph

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430522, 430517, 430518, 430559, 544140, 544296, 546119, 546199, 546211, 546255, 546256, 548183, 548243, 548247, 548249, 548226, 5483027, 5483114, 5483124, 5483647, 5483654, 5483651, 5483741, 5483761, 5483771, 548485, 548579, G03C 1815

Patent

active

061596736

ABSTRACT:
An oxonol compound is represented by the following formula (I): ##STR1## in which Z is an atomic group that forms a cyclic amide ring; each of W.sup.1 and W.sup.2 independently is an atomic group that forms an acidic nucleus ring; and M is a cation. Other oxonol compounds, a light-sensitive material containing an oxonol compound and a process for the synthesis of an oxonol compound are also disclosed.

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