Oxidants for reducing post-process D-min increase in positive re

Details Oxidants for reducing post-process D-min increase in positive re Oxidants for reducing post-process D-min increase in positive re

1983-07-06

1984-11-27

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430212, 430236, G03C 554, G03C 140, G03C 700

Patent

active

044851642

ABSTRACT:
Photographic elements and assemblages are described employing positive-working redox dye-releasers, wherein the element contains an oxidant which is located between the support and the photosensitive portion thereof. The oxidant has an electrode potential of from about -200 mV up to about 1200 mV versus a saturated calomel electrode at a pH of about 5 to about 6. After processing, the oxidant reacts with the electron transfer agent to prevent it from reacting with the dye releaser which would otherwise cause further dye release. The reduced form of the oxidant is then substantially incapable of reducing the positive-working redox dye-releaser. D.sub.min stability is thereby improved.

REFERENCES:
patent: 2728659 (1955-12-01), Loria et al.
patent: 3185567 (1965-05-01), Rogers
patent: 3700453 (1972-10-01), Knechnel
patent: 3880658 (1975-04-01), Lestina et al.
patent: 4139379 (1979-02-01), Chasman et al.
patent: 4139389 (1979-02-01), Hirshaw et al.
patent: 4396699 (1983-08-01), Janssens et al.
patent: 4409315 (1983-10-01), Armour et al.

Affiliated with

Also associated with

Rating

Oxidants for reducing post-process D-min increase in positive re does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Oxidants for reducing post-process D-min increase in positive re, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Oxidants for reducing post-process D-min increase in positive re will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2134745