Overlay targets with isolated, critical-dimension features...

Details Overlay targets with isolated, critical-dimension features... Overlay targets with isolated, critical-dimension features...

2007-10-16

2007-10-16

Pham, Hoa Q. (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C430S022000, C430S030000

Reexamination Certificate

active

11218127

ABSTRACT:
An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively block specularly reflected light. In addition, certain non-periodic, isolated targets are disclosed suitable for evaluating overlay registration.

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