Overlay target for precise positional determination

Details Overlay target for precise positional determination Overlay target for precise positional determination

1998-10-20

2000-02-08

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

438401, 382151, G03F 900

Patent

active

060226501

ABSTRACT:
An overlay target for the precision measurement is provided, including a substrate box formed over or in a substrate and a top box formed over the substrate box 13 and the substrate. The substrate box is of square with its side of 10 microns long. The top box is formed as a square opening composed of a layer of either a positive or negative type photo-resist with its side 10 microns long. These boxes are disposed rotated by 45.degree. with respect to each other and the centers of the box marks are aligned during process steps to coincide with each other to thereby result in a minimal amount of displacement, if any, between the centers. Following the measurements of the lengths of the sections a, b, c and d, which are defined by the overlap between the top and substrate boxes on the confronting sides, amounts of displacement between the centers of the two boxes are determined using the relationships, X.sub.reg =(b-a)/4 and Y.sub.reg =(d-c)/4.

REFERENCES:
patent: 4309813 (1982-01-01), Hull
P.R. Anderson et al.: SPIE vol.2196, pp. 383-388 (1994).
Ian Fink et al.: SPIE vol. 2196, pp. 389-399 (1994).
Yasushi Tanaka et al.: SPIE vol. 1926, pp. 429-439 (1193).

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