Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2005-08-30
2005-08-30
Smith, Zandra V. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C430S022000, C430S030000
Reexamination Certificate
active
06937337
ABSTRACT:
A method of determining alignment error in electronic substrates comprises providing on a layer of a substrate a first contrasting set of elements forming a first grid pattern having a plurality of grid segments in the x and y directions. The method also includes providing nested within at least one of the first grid pattern segments, on the same or different layer of a substrate, a second contrasting set of elements forming a second grid pattern having a plurality of grid segments in the x and y directions. The method then includes determining the center of the first set of elements in the first grid pattern and determining the center of the second set of elements in the second grid pattern. The method then comprises comparing the centers of the first and second sets of elements and determining alignment error of the first and second grid patterns.
REFERENCES:
patent: 4166219 (1979-08-01), Ausschnitt et al.
patent: 4290384 (1981-09-01), Ausschnitt et al.
patent: 4437760 (1984-03-01), Ausschnitt
patent: 4538105 (1985-08-01), Ausschnitt
patent: 4890239 (1989-12-01), Ausschnitt et al.
patent: 5629772 (1997-05-01), Ausschnitt
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5731877 (1998-03-01), Ausschnitt
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5790254 (1998-08-01), Ausschnitt
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5877861 (1999-03-01), Ausschnitt et al.
patent: 5914784 (1999-06-01), Ausschnitt et al.
patent: 5953128 (1999-09-01), Ausschnitt et al.
patent: 5965309 (1999-10-01), Ausschnitt et al.
patent: 5976740 (1999-11-01), Ausschnitt et al.
patent: 6004706 (1999-12-01), Ausschnitt et al.
patent: 6020966 (2000-02-01), Ausschnitt et al.
patent: 6027842 (2000-02-01), Ausschnitt et al.
patent: 6061119 (2000-05-01), Ota
patent: 6061606 (2000-05-01), Ross
patent: 6128089 (2000-10-01), Ausschnitt et al.
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 6183919 (2001-02-01), Ausschnitt et al.
patent: 6317211 (2001-11-01), Ausschnitt et al.
patent: 6335151 (2002-01-01), Ausschnitt et al.
patent: 6346979 (2002-02-01), Ausschnitt et al.
patent: 6350548 (2002-02-01), Leidy et al.
patent: 6417929 (2002-07-01), Ausschnitt et al.
patent: 6429667 (2002-08-01), Ausschnitt et al.
patent: 6457169 (2002-09-01), Ross
patent: 6460265 (2002-10-01), Pogge et al.
patent: 6638671 (2003-10-01), Ausschnitt et al.
patent: 2003/0053057 (2003-03-01), Mishima
Ausschnitt Christopher P.
Morillo Jaime D.
DeLio & Peterson LLC
Li Todd M.C.
Peterson Peter W.
Smith Zandra V.
Stock, Jr. Gordon J.
LandOfFree
Overlay target and measurement method using reference and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Overlay target and measurement method using reference and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Overlay target and measurement method using reference and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3442310