Overlay measurement methods with firat based probe microscope

Measuring and testing – Surface and cutting edge testing – Roughness

Reexamination Certificate

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Details

C250S306000

Reexamination Certificate

active

07461543

ABSTRACT:
A method, system and unit for determining alignment in a layered device such as a semiconductor device includes providing a first layer having detectable surface and subsurface material properties and positioning a patterned photoresist layer over the first layer, patterned photoresist layer having detectable surface and subsurface material properties. The layers are imaged with a FIRAT probe to detect the material properties, and the detectable material properties are compared for mapping an alignment of the compared detectable material properties. The first layer may be a substrate or have a previously processed layer formed thereon. A surface topography may be included over the substrate and an etchable layer formed over the substrate or first layer. The FIRAT probe may be a single tip probe or a dual tip probe.

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patent: 2003/0081651 (2003-05-01), Gianchandani et al.
patent: 2005/0056782 (2005-03-01), Shekhawat et al.

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