Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
Reexamination Certificate
2007-10-16
2007-10-16
Lindsay, Jr., Walter (Department: 2812)
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Having substrate registration feature
C438S005000, C438S022000, C438S462000, C257SE23179
Reexamination Certificate
active
11175441
ABSTRACT:
An overlay key includes a first overlay key having a first main overlay pattern and a first auxiliary pattern, and a second overlay key having a second main overlay pattern and a second auxiliary overlay pattern, the second auxiliary overlay pattern formed at a location corresponding to the first auxiliary overlay pattern.
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Bae Young-Guk
Baek Kyoung-Yoon
Dinh Thu-Huong
Lindsay, Jr. Walter
Volentine & Whitt PLLC
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