Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1999-04-20
2000-12-26
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
257797, 438401, 438975, G03F 900
Patent
active
061656569
ABSTRACT:
An aberration estimation reticle is provided with a plurality of units spaced from each other. The unit is provided with a first determination mark having a square planar configuration, and a second determination mark located in the first determination mark and including a plurality of holes arranged along a square. These structures provide an overlay error determination reticle and a method of determining an overlay error with the reticle taking an influence by aberration into consideration.
REFERENCES:
Young-Hong Min et al., "Effective Alignment Techniques and its Implementation to Enhance Total Overlay Accuracy on Highly Reflective Films", SPIE, vol. 2439, pp. 287-297.
Souichi Katagiri et al., "Overlay Error Estimation of Water Rear Surface Alignment for 0.1.mu.m Lithography", Jpn. J. Appln. Phys., vol. 32, pp. 6039-6043.
C.S. Lee et al., "Overlay and Lens Distortion in a Modified Illumination Stepper", SPIE, vol. 2197, pp. 2-8.
Pei-yang Yan et al., "Effect of Lens Aberration on Oblique Illumination Stepper System", SPIE, vol. 1927, Optical/Laser Microlithography VI (1993), pp. 167-180.
Nigel R. Farrar, "Effect of Off-Axis Illumination on Stepper Overlay", SPIE, vol. 2439, pp. 273-280.
Mitsubishi Denki & Kabushiki Kaisha
Young Christopher G.
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