Overlay alignment mark design

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Reexamination Certificate

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C356S400000

Reexamination Certificate

active

06894783

ABSTRACT:
A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value. Another aspect of the present invention is directed towards a method for measuring the relative position between two layers of a device. The method begins by providing a mark as described above. A beam is scanned in a first path across the mark. A beam is then scanned in a second path across the mark. Signals are generated with respect to the portion of each beam which reflects off the surface of the device so that the registration error between the two layers may be calculated.

REFERENCES:
patent: 4475811 (1984-10-01), Brunner
patent: 4538105 (1985-08-01), Ausschnitt
patent: 4703434 (1987-10-01), Brunner
patent: 4714874 (1987-12-01), Morris et al.
patent: 4757207 (1988-07-01), Chappelow et al.
patent: 4778275 (1988-10-01), van den Brink et al.
patent: 4782288 (1988-11-01), Vento
patent: 4820055 (1989-04-01), Müller
patent: 4855253 (1989-08-01), Weber
patent: 4929083 (1990-05-01), Brunner
patent: 5017514 (1991-05-01), Nishimoto
patent: 5112129 (1992-05-01), Davidson et al.
patent: 5148214 (1992-09-01), Ohta et al.
patent: 5156982 (1992-10-01), Nagoya
patent: 5172190 (1992-12-01), Kaiser
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5262258 (1993-11-01), Yanagisawa
patent: 5296917 (1994-03-01), Kusonose et al.
patent: 5383136 (1995-01-01), Cresswell et al.
patent: 5414514 (1995-05-01), Smith et al.
patent: 5436097 (1995-07-01), Norishima et al.
patent: 5438413 (1995-08-01), Mazor et al.
patent: 5477057 (1995-12-01), Angeley et al.
patent: 5479270 (1995-12-01), Taylor
patent: 5498501 (1996-03-01), Shimoda et al.
patent: 5596413 (1997-01-01), Stanton et al.
patent: 5617340 (1997-04-01), Cresswell et al.
patent: 5627083 (1997-05-01), Tounai
patent: 5665495 (1997-09-01), Hwang
patent: 5699282 (1997-12-01), Allen et al.
patent: 5701013 (1997-12-01), Hsia et al.
patent: 5702567 (1997-12-01), Mitsui et al.
patent: 5703685 (1997-12-01), Senda et al.
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5766809 (1998-06-01), Bae
patent: 5783342 (1998-07-01), Yamashita et al.
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5835196 (1998-11-01), Jackson
patent: 5857258 (1999-01-01), Penzes et al.
patent: 5872042 (1999-02-01), Hsu et al.
patent: 5877036 (1999-03-01), Kawai
patent: 5877861 (1999-03-01), Ausschnitt et al.
patent: 5902703 (1999-05-01), Leroux et al.
patent: 5912983 (1999-06-01), Hiratsuka
patent: 5923041 (1999-07-01), Cresswell et al.
patent: 5939226 (1999-08-01), Tomimatu
patent: 5949145 (1999-09-01), Komuro
patent: 5968693 (1999-10-01), Adams
patent: 6020966 (2000-02-01), Ausschnitt et al.
patent: 6023338 (2000-02-01), Bareket
patent: 6077756 (2000-06-01), Lin et al.
patent: 6079256 (2000-06-01), Bareket
patent: 6118185 (2000-09-01), Chen et al.
patent: 6128089 (2000-10-01), Ausschnitt et al.
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 6140217 (2000-10-01), Jones et al.
patent: 6146910 (2000-11-01), Cresswell et al.
patent: 6160622 (2000-12-01), Dirksen et al.
patent: 6165656 (2000-12-01), Tomimatu
patent: 6172409 (2001-01-01), Zhou
patent: 6275621 (2001-08-01), Terry
patent: 6462818 (2002-10-01), Bareket
US 5,841,144, 11/1998, Cresswell (withdrawn)
Harry J. Levinson, “Lithography Process Control”, Bellingham, Washington USA, Tutorial Texts in Optical Engineering vol. TT28, SPIE Optical Engineering Press, pp. 96-107.
Giovanni Rivera et al., “Overlay Performance on Tungsten CMP Layers Using the Athena Alignment System”, STMicroelectronics in Agrate, Agrate Brianza, Italy.
Chungwei Hsu, Ron Chou, Tsu-Wen Hwang, “Characterizing lens distortion to overlay accuracy by using fine measurement pattern”, Mar. 1999, Santa Clara, Calif., Part of the SPIE Conference on Metrology, SPIE vol. 3677.

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