Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2004-05-17
2010-10-26
Le, Vu (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S199000
Reexamination Certificate
active
07822262
ABSTRACT:
The invention is to provide an outer surface-inspecting method, a master pattern and an outer surface-inspecting apparatus, which can eliminate severe positional alignment of the master pattern, avoid erroneous judgment taking acceptable products as unacceptable ones and suppress increase in number of standard pattern portions to be prepared as a master pattern. In the method and the apparatus, an outer surface of inspection areas16ato16ihaving repeated patterns are inspected through comparison with the predetermined master pattern. The inspection area is divided into a plurality of matrix-like view areas16ato16i. Mutually different standard pattern portions17ato17iare used depending upon different edge shapes of the divided inspection areas16ato16icontained in the inspection area, respectively. The present invention is suitable for inspecting the outer surface of a semiconductor chip such as a memory or a CCD (charge-coupled device).
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Akimoto Shigeyuki
Itoh Takashi
Buchanan & Ingersoll & Rooney PC
Kabushiki Kaisha TOPCON
Le Vu
Vanchy, Jr. Michael
LandOfFree
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