Dentistry – Prosthodontics – Holding or positioning denture in mouth
Reexamination Certificate
1999-08-31
2001-04-24
Lucchesi, Nicholas D. (Department: 3732)
Dentistry
Prosthodontics
Holding or positioning denture in mouth
C433S174000
Reexamination Certificate
active
06220861
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to an osseo-integrated dental implant, and more particularly, to an osseo-integrated dental implant having a highly polished band thereon.
BACKGROUND OF THE INVENTION
The osseo-integrated dental implant (hereinafter referred to as “implant”) is also called an endosseous implant. The clinical application of the implant is on the rapid increase because of high clinical success rate and excellent function of the implant. The implants are divided into various types, for example, an endosteal implant, a subperiosteal implant and a transosteal implant, etc. Among the various types of the implants, the endosteal implant is widely used. The endosteal implant is made of chrome-cobalt, ceramic, titanium, etc. as materials, and involves a screw type as shown in
FIG. 1A and a
cylinder type as shown in FIG.
1
B and hybrid type of screw and cylinder. These implants are independently implanted or are connected with natural tooth.
In recent years, much research and many developments of the implant have been continuously done as important tasks in dental science. However, all the research and development of the implants are focused on an increase of a contact surface between the implant and the bone, and the research in long term evaluation of the surrounding bone of the implant has been scarcely performed. Even in the clinically successful implants, since the osseeointegration is imperfect or the bone defect is generated at the cervical portion of the implants, failures of the implants frequently happen. Therefore, many sufferers will complain of pain due to disease of the surroundings of the implants.
The failures of the implants are caused by repeated microfracture of the bone due to overload to the implants or bacterial infection of the surrounding bone of the implants, etc. However, all the implants pass through peri-implantitis regardless of causes of the failures. This peri-implantitis gives rise to inflammation of mucosa, loss of attached gingiva, exposure of a cervical portion of the implant and loss of the surrounding bone, etc. Therefore, the peri-implantitis has to be properly treated at an initial stage to maintain functions of the implant.
FIG. 2A
illustrates the peri-implantitis in progress in surroundings of implant and this state requires treatment of the implant and surrounding tissue.
Conventionally, the periosurgery is performed in the surroundings of the implant and the toxin, which is formed in the root portion of the infected implantis, is removed in order to treat the peri-implantitis at the initial stage. Also, the surface of the screw of the implant shown in
FIG. 2B
or the unevenness of a plasma surface or coated surface by hydroxypatite is removed and then the surface is highly polished.
However, the implant according to the prior art has a disadvantage in that it is very difficult to accurately polish the infected surface of a subgingival area in a root portion of the implant by a curette for dental implant or a dental high speed burr for treatment of the peri-implantitis. Also, the implant according to the prior arts has a problem in that a bone defect and inflammation may be rapidly and downwardly spread due to rough surface characteristics when bone damage occurs at a cervical portion of the implant.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a new and improved osseo-integrated dental implant wherein the implant with peri-implantitis in progress can be easily treated and then the longevity of the implant can be lengthened.
It is another object of the present invention to provide a new and improved osseo-integrated dental implant preventing a bone defect and inflammation at a surface of the implant from being downwardly spread.
It is further object of the present invention to provide a new and improved osseo-integrated dental implant serving as a base for a polishing exposure surface of root of the infected implant with a bone defect in progress.
According to the present invention, these and other objects and advantages are by providing an osseo-integrated dental implant comprising a band which is spaced apart from an upper end of a root of the implant at a predetermined distance and which is polished in a circumferential direction.
The various features of novelty which characterize the invention are pointed out with particularity in the claims annexed to and forming a part of this disclosure.
For a better understanding of the invention, its operating advantages and specific objects attained by its uses, reference is made to the accompanying drawings and descriptive matter in which the preferred embodiments of the invention are illustrated.
REFERENCES:
patent: 5316476 (1994-05-01), Krauser
patent: 5324199 (1994-06-01), Branemark
Hyun Young Keun
Kwon Jong Jin
Lucchesi Nicholas D.
Staas & Halsey , LLP
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