Abrading – Rigid tool
Patent
1995-05-19
1996-10-01
Meislin, D. S.
Abrading
Rigid tool
407 291, B23F 2103
Patent
active
055607454
ABSTRACT:
An article having a hard surface of oriented particles for abrasive or wear-resistant applications is provided and includes a plurality of synthetic single crystals of diamond or cubic boron nitride, or like materials, oriented in a formation so that their corresponding crystallographic directions of maximum hardness, i.e., maximum abrasive resistance, are aligned, whereby the group of crystals, which form a working surface, exhibits a common direction of maximum hardness across the surface, and to a method of making such an article.
REFERENCES:
patent: 3230672 (1966-01-01), Anthon
patent: 3906684 (1975-09-01), Marshall et al.
patent: 3918217 (1975-11-01), Oliver
patent: 3963458 (1976-06-01), Gladstone et al.
patent: 4047902 (1977-09-01), Wiand
patent: 4240807 (1980-12-01), Kronzer
patent: 4317660 (1982-03-01), Kramis et al.
patent: 4916869 (1990-04-01), Oliver
patent: 4925457 (1990-05-01), Dekok et al.
patent: 5107626 (1992-04-01), Mucci
patent: 5152917 (1992-10-01), Pieper et al.
patent: 5203881 (1993-04-01), Wiand
patent: 5213589 (1993-05-01), Ronning et al.
patent: 5239784 (1993-08-01), Stanfield
patent: 5250084 (1993-10-01), Lansell et al.
patent: 5273558 (1993-12-01), Nelson et al.
patent: 5304223 (1994-04-01), Pieper et al.
patent: 5366523 (1994-11-01), Rowenhorst et al.
patent: 5443418 (1995-08-01), Frodin et al.
Geis, et al., "Large Area Mosaic Diamond Films Approaching Single Crystal Quality," Applied Physical Letters, vol. 58, No. 22 (Jun. 3, 1991), 2485-87.
Costello Leo F.
Edwards Dona C.
Meislin D. S.
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