Organosilicon compound and use thereof in photolithography

Organic compounds -- part of the class 532-570 series – Organic compounds – Diazo or diazonium

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534560, 534561, 534562, 534563, 430193, 528 28, 528 27, G03C 152, C07C11300, C08G 7740

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active

046031952

ABSTRACT:
A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.

REFERENCES:
patent: 4283249 (1981-08-01), Ephrath
Elsevier Scientific Publications, Amsterdam 1981, Chapter 8, "Quinonediazides in Practical Applications," Erschoo, et al., pp. 282-297.
Journal of the Electrochemical Society, vol. 127, No. 3, Mar. 1980, Deckert, et al., "Microlithography-Key to Solid-State Fabrication", pp. 45C-56C.
Fried, et al., IBM, Journal Research Development, vol. 26, No. 3, pp. 362-371.
Roberts, Journal of Electrochemical Society, vol. 120, p. 1716, 1973.
Gazard, et al., Applied Polymer Symposium, No. 23, pp. 107-116, 1974.
Hatzakis, et al., Processing Microcircuit Engineering (Lausanne), p. 396, Sep. 1981.
Shaw, et al., "Organosilicon Polymers for Lithographic Applications", Polymer Engineering and Science, Dec. 1983, vol. 23, No. 18, pp. 1054-1058.
Chemical Abstracts, vol. 87, 1977, pp. 631-632, "Organometallic and Organometalloidal Compounds", Item 87: 102402w, Kozlova, et al.
Chemical Abstracts, vol. 87, 1977, p. 511 Radiation Chem., Photochem., Item 87: 209484b, Kozlova, et al.

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