Organosilane compound and organosilica obtained therefrom

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C556S463000, C526S279000

Reexamination Certificate

active

08053588

ABSTRACT:
Provided is an organosilane compound expressed by any one of the following general formulae (1) to (7):(wherein: Ar represents a phenylene group or the like; R1represents a hydrogen atom or the like; R2to R8each represent a methyl group or the like; n represents an integer in a range from 0 to 2; m represents an integer of 1 or 2; L represents a single bond or the like; X represents a hydrogen atom or the like; and Y represents a hydrogen atom or the like).

REFERENCES:
patent: A-2006-89588 (2006-04-01), None
Maegawa et al, Tetrahedron, 2007, 63, 11467-11474.
Deng et al., “An Efficient Convergent Synthesis of Novel Anisotropic Adsorbates Based on Nanometer-Sized and Tripod-Shaped Oligophenylenes End-Capped with Triallylsilyl Groups,”Journal of Organic Chemistry,2002, vol. 67, pp. 5279-5283.
Kapoor et al., “An Alternate Route for the Synthesis of Hybrid Mesoporous Organosilica with Crystal-Like Pore Walls from Allylorganosilane Precursors,”J. Am. Chem. Soc.,2005, vol. 127, pp. 8174-8178.
Kapoor et al., “Self-assembly of cubic phenylene bridged mesoporous hybrids from allylorganosilane precursors,”J. Mater Chem.,2006, vol. 16, pp. 3305-3311.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Organosilane compound and organosilica obtained therefrom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organosilane compound and organosilica obtained therefrom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organosilane compound and organosilica obtained therefrom will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4268578

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.