Organometallic source compounds for chemical vapor deposition

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

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564511, C07F 710

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058920838

ABSTRACT:
Compounds of the formula

REFERENCES:
CA:120:66309 abs of JP05136063, Jun. 1993.
CA:84:43488 abs of "Chemistry of N-aryl-substituted metal amides VII" Froehlich, Z Chem, 15(8), pp. 316-317, 1975.
CA:115:84156 abs of "The synthesis of bis(hexamethyldisilylamido) barium(II)", Boncella, Polyhedron, 10(7), pp. 769-770, 1991.
CA:115220101 abs of "Synthesis and Chemistry of the bis(trimethylsilyl) amido bis tetra hydrofuranates of Group 2 metals magnesium ,calcium , strontium and barium", Bradley, Polyhedron, 9 (24), pp. 2959-2964, 1990.
Inorg Chem, Gindelberger "Preparation and Properties of Mg, Ca, Sr, and Ba Selenolates and Tellurolates". 33, pp. 6293-6299, Dec. 1994.
CA: 121:314489 abs of Gindelberger's Inorganic chem paper 33(26) pp. 6293-6299, Dec. 1994.
CA:126:126085 abs of "1,3-Bis (trimethylsilyl)-2-phenyl-1-aza-3-phosphapropenide Anions as Bidentate Ligands", Westerhausen, Inor Chem, 36(4) pp. 521-527, Feb. 1997.

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