Organometallic precursor compounds

Details Organometallic precursor compounds Organometallic precursor compounds

2007-07-17

2007-07-17

Page, Thurman K. (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

C556S040000, C556S041000, C556S059000

Reexamination Certificate

active

11037085

ABSTRACT:
This invention relates to organometallic precursor compounds represented by the formula (L)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L′ is the same or different and is a π acceptor ligand, a process for producing the organometallic precursor compounds, and a method for producing a film, coating or powder from the organometallic precursor compounds.

REFERENCES:
patent: 6420583 (2002-07-01), Lienhard et al.
patent: 6521772 (2003-02-01), Lienhard et al.
patent: 2004/0010158 (2004-01-01), Meire et al.
Huicai Zhong et al., “Properties of Ru—Ta Alloys as Gate Electrodes For NMOS and PMOS Silicon Devices”IEDM 200120.5.1.
L.R.C. Fonseca et al., “First-Principles Calculation of the Work Function of Metals on High-K Metal Oxides”Fall MRS 2003E4.3.
Matous Mrovec et al., Schottky Barriers at Transition-metal/Strontium—titanate Contacts,Fall MRS 2003 E4.2.
Gordon et al., “Low-temperature atmospheric-pressure metal-organic chemical vapor deposition of molybdenum nitride thin films”,Thin Solid Films1996 288 116.
Van den hove et al, “Lithography for sub-90nm applications”,IEEE2002.
Rausch et al., Functionally Substituted Derivatives of (n5-C5H5)M(CO)2NO (M =Cr, Mo, W)Organometallics1983, 2, 1523.
Legzdins et al., Dicarbonyl (η5-Cyclopentadienyl)Nitrosyl Complexes of Chromium, Molybdenum, and Tungsten,Inorg. Synth, 1990, 28, 196.

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