Compositions – Electrically conductive or emissive compositions
Reexamination Certificate
2008-05-20
2008-05-20
Kopec, Mark (Department: 1796)
Compositions
Electrically conductive or emissive compositions
C106S287100, C427S252000, C427S558000, C438S650000
Reexamination Certificate
active
10874284
ABSTRACT:
A composition of (i) an organometallic precursor containing a hydrazine compound coordinating with a central metal thereof and (ii) an organometallic compound of a main group metal and a method of forming metal film or pattern using this composition.
REFERENCES:
patent: 4186244 (1980-01-01), Deffeyes et al.
patent: 4463030 (1984-07-01), Deffeyes et al.
patent: 4598056 (1986-07-01), Barraud et al.
patent: 5064685 (1991-11-01), Kestenbaum et al.
patent: 5130172 (1992-07-01), Hicks et al.
patent: 5173330 (1992-12-01), Asano et al.
patent: 5204313 (1993-04-01), Lelental et al.
patent: 5360635 (1994-11-01), Richards et al.
patent: 5534312 (1996-07-01), Hill et al.
patent: 5882722 (1999-03-01), Kydd
patent: 6036889 (2000-03-01), Kydd
patent: 6599587 (2003-07-01), Chung et al.
patent: 6774034 (2004-08-01), Byun et al.
patent: 7084288 (2006-08-01), Son et al.
patent: 2004/0010158 (2004-01-01), Meiere et al.
patent: 2004/0219369 (2004-11-01), Garg et al.
Vogel et al., Angewandte Chemie International Edition in English, vol. 30, No. 3, pp. 303-304 (1991).
Byun Young Hun
Hwang Euk Che
Lee Sang Yoon
Ryu Joon Sung
Son Hae Jung
Kopec Mark
Nguyen Khanh Tuan
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