Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Reexamination Certificate
2005-04-26
2005-04-26
Nazario-Gonzalez, Porfirio (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
C427S252000, C427S587000
Reexamination Certificate
active
06884902
ABSTRACT:
An organometallic compound having a low melting point, excellent vaporization characteristic and low film formation temperature on a substrate, for forming an iridium-containing thin film by the CVD process is provided. The organometallic iridium compound is represented by the following general formula (1) or (2):wherein R1represents hydrogen or a lower alkyl group; R2to R7each represents hydrogen, a halogen, or the like, provided that specific combinations of R1to R7are excluded; R8represents a lower alkyl group; R9to R12each represents hydrogen, a halogen, or the like, provided that specific combinations of R8to R12are excluded. Iridium-containing thin films are produced by using the compound as a precursor by CVD process.
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Kawano Kazuhisa
Oshima Noriaki
Takamori Mayumi
Nazario-Gonzalez Porfirio
Sughrue & Mion, PLLC
Tosoh Corporation
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