Organometallic chemical vapor deposition of films utilizing orga

Details Organometallic chemical vapor deposition of films utilizing orga Organometallic chemical vapor deposition of films utilizing orga

1983-10-18

1985-04-09

Saba, William G.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

29576E, 148174, 156612, 156613, 156614, 156DIG70, 427 87, H01L 21205, H01L 21365

Patent

active

045099979

ABSTRACT:
There is provided a method of producing inorganic thin films by metal inorganic chemical vapor deposition. The method comprises forming a vapor stream comprising a vapor mixture of an organometallic compound and a heterocyclic organic compound incorporating a group V or group VI element, and thermally decomposing the mixture on a heated substrate to form an inorganic layer. The heterocyclic compound may be an aliphatic or aromatic ring compound. The mixture may include vapors appropriate for deposition of ternary or higher order compounds, and/or for introducing dopants.

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patent: 4214926 (1980-07-01), Katsuto et al.
patent: 4247359 (1981-01-01), Venkatasetty
patent: 4250205 (1981-02-01), Constant et al.
patent: 4368098 (1983-01-01), Manasevit

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