Organometal-containing compounds

Details Organometal-containing compounds Organometal-containing compounds

1988-08-29

1990-04-10

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

556 87, 556 88, 556 93, 556420, 556430, 556437, 556107, 556440, C07F 708, C07F 704, C07F 722, C07F 730

Patent

active

049162470

ABSTRACT:
Organometal-containing styrene derivatives of the formula I ##STR1## in which, for example, M is Si, X is 0, R.sup.1 and R.sup.2 are hydrogen, R.sup.4 to R.sup.6 are each methyl, a is zero and R.sup.7 is hydrogen or methyl, and organometal-containing compounds of the formula VII ##STR2## in which M and R.sup.1 to R.sup.6 are, for example, as defined above and Y is, for example, 4-nitrophenoxy, are valuable starting materials for the preparation of organometal-containing polymers. The polymers are suitable for the preparation of photoresists which can be developed under dry conditions, such as are required in the production of structured images, particularly in microelectronics.

REFERENCES:
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patent: 3321361 (1967-05-01), Mem et al.
patent: 3629196 (1971-12-01), Hahn et al.
patent: 4481365 (1984-11-01), Furster et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4689288 (1987-08-01), Buiguez et al.
H. Franke, Appl. Phys. Letters, 45, 110 (1984).
F. Buiquez et al., Microcircuit Eng., 1985, 471.
O.G Notice of 4,443,044.

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