Organic sulfonic acid stripping composition and method with nitr

Details Organic sulfonic acid stripping composition and method with nitr Organic sulfonic acid stripping composition and method with nitr

1979-03-09

1980-09-09

Pitlick, Harris A.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 134 41, 134 42, 252142, 252143, 252148, 252558, C11D 343, B08B 308, C23G 502

Patent

active

042216745

ABSTRACT:
Improved organic stripping compositions useful in removing polymeric organic substances, such as photoresist, from metal substrates which comprise one or more organic sulfonic acids, one or more organic solvents and, optionally phenol. The inhibitors system includes 5 to 300 ppm by weight of fluoride per weight of composition and between about 0.01 and about 5 weight percent of a nitrile compound such as acetonitrile or malononitrile.

REFERENCES:
patent: 1759840 (1930-05-01), Cole et al.
patent: 2508215 (1950-05-01), Bishop et al.
patent: 3335088 (1967-08-01), Mandell
patent: 3862250 (1975-01-01), Beckers
patent: 3876371 (1975-04-01), Costain et al.
patent: 3932130 (1976-01-01), Bennett et al.
patent: 4070203 (1978-01-01), Neisius et al.

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