Organic stripping compositions and method for using same

Details Organic stripping compositions and method for using same Organic stripping compositions and method for using same

1976-10-04

1979-08-21

Willis, Jr., P. E.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 134 41, 252142, 252153, C11D 708, C11D 734, C23G 102

Patent

active

041652959

ABSTRACT:
Improved organic stripping compositions are described, useful in removing polymeric organic substances, such as photoresists, from metallized inorganic substrates, which comprise one or more organic sulfonic acids, such as linear dodecylbenzenesulfonic acid, para-toluenesulfonic acid and phenolsulfonic acid, one or more organic solvents and optionally, phenol, wherein the improvement comprises incorporating fluoride ion in the composition in an amount of about 5 to 250 ppm by weight, preferably about 10 to 200 ppm by weight and more preferably about 15 to 100 ppm by weight. Methods for using the above compositions to remove the polymeric organic substances from metallized inorganic substrates are also described.

REFERENCES:
patent: 1890214 (1932-12-01), Churchill
patent: 2413365 (1946-12-01), McCoy
patent: 2687346 (1954-08-01), McDonald
patent: 3019194 (1962-01-01), Brite
patent: 3075923 (1963-01-01), Berst et al.
patent: 3335088 (1967-08-01), Mandell
patent: 3574123 (1971-04-01), Laugle
patent: 3582401 (1971-06-01), Berilla et al.
patent: 3598741 (1971-08-01), Kanno
patent: 3871929 (1975-03-01), Schevey et al.
patent: 3932130 (1976-01-01), Bennett et al.
patent: 4009115 (1977-02-01), Binns
patent: 4116853 (1978-09-01), Binns

Affiliated with

Also associated with

Rating

Organic stripping compositions and method for using same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organic stripping compositions and method for using same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organic stripping compositions and method for using same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1322803