Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1996-04-19
1998-12-15
Wilson, Donald R.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522 57, 522 59, 522120, 528129, 528153, 528230, 525312, C08J 328, C08G 824, C08G 820
Patent
active
058498087
ABSTRACT:
A polymer which is insoluble in aqueous-alkaline developer solutions, and comprises structural units of the formula (I): ##STR1## in which R.sub.2 is hydrogen, C.sub.1 -C.sub.18 alkyl, C.sub.5 -C.sub.10 cycloalkyl, C.sub.5 -C.sub.14 aryl, C.sub.6 -C.sub.30 aralkyl, R.sub.3 is C.sub.1 -C.sub.18 alkyl, C.sub.5 -C.sub.10 cycloalkyl, C.sub.5 -C.sub.14 aryl, or C.sub.6 -C.sub.30 aralkyl, it being possible for the alkyl, cycloalkyl, aryl, or aralkyl groups to be substituted if desired by one or more hydroxyl groups or nitro groups or by one or more halogen atoms, and X is a k+1 valent organic radical, k being a number from 1 to 5, and 1 is a number from 0 to 4, in a quantity such that the cleavage products obtained by reaction with an acid are soluble in aqueous-alkaline developer solutions, is suitable as a binder for DUV photoresists of high processing stability, high contrast, and good resolution.
REFERENCES:
patent: 332913 (1885-07-01), Lundberg
patent: 3964907 (1976-06-01), Marsh
patent: 4713441 (1987-12-01), Heller et al.
patent: 5238781 (1993-08-01), Schadeli
patent: 5354643 (1994-10-01), Cabrera et al.
patent: 5496678 (1996-03-01), Imai et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5650259 (1997-07-01), Imai et al.
Flory, "Principles of Polymer Chemistry", Cornell University Press, Ithaca, New York, p. 361 (1953).
"Hawley's Condensed Chemical Dictionary", 12th ed., Van Nostrand Reinhold Co., New York, p. 325 (1993).
Muenzel Norbert
Schacht Hans-Thomas
Olin Microelectronic Chemicals, Inc.
Wilson Donald R.
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