Coating processes – Electrical product produced
Reexamination Certificate
2004-04-16
2010-06-29
Cameron, Erma (Department: 1715)
Coating processes
Electrical product produced
C427S096100, C427S096200, C427S096500, C427S385500, C427S387000
Reexamination Certificate
active
07744946
ABSTRACT:
The present invention relates to organic siloxane resins and insulating films using the same. The insulating films are manufactured by using organic siloxane resins, wherein organic siloxane resins are hydrolysis-condensation polymers of silane compounds comprising one or more kinds of hydrosilane compounds. They have superior mechanical properties and a low electric property, and therefore, are properly usable for highly integrated semiconductor devices.
REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 5116637 (1992-05-01), Baney et al.
patent: 5262201 (1993-11-01), Chandra et al.
patent: 5855962 (1999-01-01), Cote et al.
patent: 5906859 (1999-05-01), Bremmer et al.
patent: 6399210 (2002-06-01), Zhong
patent: 6410141 (2002-06-01), Grimmer
patent: 6790533 (2004-09-01), Reitmeier et al.
patent: 6824833 (2004-11-01), Nishikawa et al.
patent: 7057002 (2006-06-01), Lee et al.
patent: 2001/0055892 (2001-12-01), Nishikawa et al.
patent: 2002/0106500 (2002-08-01), Albano et al.
patent: 2001-206710 (2001-07-01), None
patent: 1020020097415 (2002-12-01), None
patent: 1020030000709 (2003-01-01), None
Translation of KR 20020097415, Dec. 2002.
Translation of KR 20030000709, Jan. 2003.
Choi Bum-gyu
Kang Gwi-gwon
Kang Jung-won
Ko Byung-ro
Ko Min-jin
Cameron Erma
LG Chem Ltd.
McKenna Long & Aldridge LLP
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