Organic semiconductor film forming method, organic...

Details Organic semiconductor film forming method, organic... Organic semiconductor film forming method, organic...

2006-06-23

2011-12-20

Trinh, Michael (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S099000, C257SE21024

Reexamination Certificate

active

08080438

ABSTRACT:
A method for forming an organic semiconductor film having a high carrier mobility is provided by having an average volatilization rate of a solvent within a prescribed range during a step of drying, at the time of applying a coating solution, which includes an organic semiconductor material and a non-halogen solvent, on a substrate. In such forming method, characteristic fluctuation in repeated use of the organic semiconductor film is suppressed, and an organic thin film transistor having an excellent film forming characteristic even on an insulator with reduced gate voltage threshold can be obtained.

REFERENCES:
patent: 7795611 (2010-09-01), Nakamura
patent: 2004/0186265 (2004-09-01), Liu et al.
patent: 2005/0258417 (2005-11-01), Minakata
patent: 2004-273678 (2004-09-01), None
patent: WO 03/016599 (2003-02-01), None
S.C. Lim et al., “Surface-treatment effects on organic thin-film transistors”, Synthetic Metals 148, pp. 75-79, 2005.

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