Organic photosensitive member with non-directive upheave pattern

Details Organic photosensitive member with non-directive upheave pattern Organic photosensitive member with non-directive upheave pattern

1988-06-24

1990-06-12

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430128, G03G 514

Patent

active

049332473

ABSTRACT:
The present invention provide a photosensitive member comprising at least an organic photoconductive layer and a surface protective layer on an electrically conductive substrate, wherein the surface protective layer comprises an amorphous carbon layer with non-directive upheave patterns, which is formed by a glow discharge method.
A photosensitive member of the invention is excellent in the reproducibility of fine lines as well as the improvement of the prevention of filming phenomenon.
A photosensitive member of the invention can be used for a long time.

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patent: 4687723 (1987-08-01), Oshima et al.
patent: 4740440 (1988-04-01), Honda et al.
patent: 4770966 (1988-09-01), Kazama et al.

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