Organic photosensitive material for electrophotography

Details Organic photosensitive material for electrophotography Organic photosensitive material for electrophotography

1993-09-30

1995-09-12

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 59, 430 83, G03G 5047, G03G 509

Patent

active

054495806

ABSTRACT:
Disclosed is an organic photosensitive material for electrophotography which is characterized by containing a specific diphenoquinone derivative in an organic photosensitive layer of the material. The diphenoquinone derivative is a compound represented by the following general formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are alkyl groups, alkoxy groups, aryl groups or aralkyl groups, and at least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is an aryl group or an aralkyl group, and at least 2 of the remaining R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are alkyl groups or alkoxy groups,
the organic photosensitive material mentioned above has excellent sensitivity and residual potential.

REFERENCES:
patent: 5166016 (1992-11-01), Badesha et al.
patent: 5176976 (1993-01-01), Kikuchi et al.
patent: 5213923 (1993-05-01), Yokoyama et al.
patent: 5213926 (1993-05-01), Hanatani et al.
patent: 5288573 (1994-02-01), Hung et al.
patent: 5324610 (1994-06-01), Tanaka et al.
Patent Abstracts of Japan vol. 14, No. 1(P-985) (3944) 8 Jan. 1990 & JP-A-01 253 753 (Konica) 11 Oct. 1989.
Patent Abstracts of Japan vol. 13, No. 460 (P-946) (3803) 18 Oct. 1989 & JP-A-01 179 160 (Konica) 17 Jul. 1989.

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