Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate
2005-08-30
2005-08-30
Dang, PHuc T. (Department: 2818)
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
C438S637000
Reexamination Certificate
active
06936545
ABSTRACT:
Systems and methods are disclosed for creating memory cells on a silver interconnect substrate. The silver substrate is initially subject to a CMP process followed by cycles of exposure to inorganic and organic acids, as well as growing Ag/Ag2S layers. The resulting smooth Ag interconnect surface is then employed for basing the memory cell layers thereupon.
REFERENCES:
patent: 6706625 (2004-03-01), Sudijono et al.
Subramanian Ramkumar
Xie James J.
Amin & Turocy LLP
Dang PHuc T.
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