Organic film vapor deposition method and a scintillator panel

Details Organic film vapor deposition method and a scintillator panel Organic film vapor deposition method and a scintillator panel

2006-05-23

2006-05-23

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Organic coating applied by vapor, gas, or smoke

C427S065000, C427S069000, C427S070000, C427S160000, C427S209000, C427S255700, C250S362000, C250S370110

Reexamination Certificate

active

07048967

ABSTRACT:
An organic film vapor deposition method includes a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from the vapor deposition table; a second step of introducing the vapor deposition table having the substrate supported by the target-support element into a vapor deposition chamber of a CVD apparatus; and a third step of depositing an organic film by CVD method onto all surfaces of the substrate, provided with the scintillator, introduced into the vapor deposition chamber.

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