Organic film vapor deposition method

Details Organic film vapor deposition method Organic film vapor deposition method

2006-03-27

2010-02-16

Chen, Bret (Department: 1792)

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

C427S070000, C427S160000, C427S255600, C427S255700

Reexamination Certificate

active

07662427

ABSTRACT:
An organic film vapor deposition method includes a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from the vapor deposition table; a second step of introducing the vapor deposition table having the substrate supported by the target-support element into a vapor deposition chamber of a CVD apparatus; and a third step of depositing an organic film by CVD method onto all surfaces of the substrate, provided with the scintillator, introduced into the vapor deposition chamber.

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