Organic compound for CVD raw material and method of...

Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C106S001210, C106S128100, C427S248100, C427S587000

Reexamination Certificate

active

07002032

ABSTRACT:
The present invention provides an organic compound for CVD raw material prepared by mixing a first organometallic compound and at least one second organometallic compound, said first organometallic compound having a central metal atom and at least one ligand coordinated thereto and said second organic compound having the same central metal as that of the first organometallic compound and at least one different ligand coordinated thereto from the ligand of the first organometallic compound, wherein the first and second organometallic compounds differ in decomposition behavior. In particular, a CVD raw material having both easy handling and good adhesiveness to thin film, which have not been so far sufficiently compatible with each other, can be obtained by mixing a cyclopentadienyl complex or a derivative thereof as the first organometallic compound, and a β-diketonato compound as the second organometallic compound.

REFERENCES:
patent: 5952047 (1999-09-01), Tasaki et al.
patent: 6037485 (2000-03-01), Tasaki et al.
patent: 10-324970 (1998-12-01), None
patent: WO 98/00432 (1998-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Organic compound for CVD raw material and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organic compound for CVD raw material and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organic compound for CVD raw material and method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3659682

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.