Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Reexamination Certificate
2006-02-14
2006-02-14
Pezzuto, Helen L. (Department: 1713)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
C525S222000, C525S227000, C525S231000, C525S241000, C427S372200, C427S385500
Reexamination Certificate
active
06998442
ABSTRACT:
An organic anti-reflective polymer which prevents back reflection of lower film layers and eliminates standing wave that is occurred by a thickness change of photoresist and light, in a process for fabricating ultrafine patterns that use photoresist for lithography by using 193 nm ArF and its preparation method. More particularly, the organic anti-reflective polymer of the present invention is useful for fabricating ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such organic anti-reflective polymer, an anti-reflective coating layer made therefrom and a preparation method thereof.
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Jung Jae-Chang
Jung Min-Ho
Lee Geun-Su
Shin Ki-Soo
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
Pezzuto Helen L.
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