Orbital motion chemical-mechanical polishing apparatus and metho

Details Orbital motion chemical-mechanical polishing apparatus and metho Orbital motion chemical-mechanical polishing apparatus and metho

1993-08-06

1996-09-10

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451 60, 451446, 451505, B24B 2900, B24B 722

Patent

active

055540643

ABSTRACT:
A method and apparatus for polishing a thin film formed on a semiconductor substrate. A table covered with a polishing pad is orbited about an axis. Slurry is fed through a plurality of spaced-apart holes formed through the polishing pad to uniformly distribute slurry across the pad surface during polishing. A substrate is pressed face down against the orbiting pad's surface and rotated to facilitate, along with the slurry, the polishing of the thin film formed on the substrate.

REFERENCES:
patent: 4831784 (1989-05-01), Takahashi
patent: 5185966 (1993-02-01), Mock, Jr.
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5230184 (1993-07-01), Bukhman
patent: 5232875 (1993-08-01), Tuttle et al.
patent: 5351445 (1994-10-01), Takahashi

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